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Cities in Asia Summer Program: Studio Singapore-Shanghai

Cities in Asia Summer Program: Studio Singapore-Shanghai

Cities in Asia Summer Program: Studio Singapore-Shanghai, June 24 to July 16

We are pleased to announce that registration for this year’s Cities in Asia Summer Program is now open. The credit-bearing HKU course was established in 2010 to focus on urgent architectural and urban issues confronting Asian cities today. This year, the studio will be traveling to Singapore and Shanghai. The program is an immersive course designed to expose students to these cities through daily learning activities including lectures, seminars, studio crits, field work, firm visits, and design reviews. The nature of work ranges from critical reading of texts and individual assignments, to design and research collaborations. Students will get to interact with professors, researchers, critical practices, think tanks and various local stakeholders, as well as with students from other universities.

The programme welcomes all undergraduate and graduate students, and recent graduates in the disciplines of architecture, landscape, urban design, urban planning and policy, urban studies and all allied design and engineering fields. Liberal arts students with a relevant major or minor are also eligible. The deadline for enrolment is April 15, 2019. For more details about eligibility and application, please visit: http://fac.arch.hku.hk/summer/cities-in-asia/ Please do not hesitate to contact the program secretary Olivia Lai for queries: olilai@hku.hk.

This call for submissions was submitted by an ArchDaily user. If you'd like to submit a competition, call for submissions or other architectural 'opportunity' please use our "Submit a Call for Submissions" form. The views expressed in announcements submitted by ArchDaily users do not necessarily reflect the views of ArchDaily.

Cite: "Cities in Asia Summer Program: Studio Singapore-Shanghai" 07 Feb 2019. ArchDaily. Accessed . <https://www.archdaily.com/910854/cities-in-asia-summer-program-studio-singapore-shanghai> ISSN 0719-8884

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